Situ rate and depth monitor for silicon etching

Details Situ rate and depth monitor for silicon etching Situ rate and depth monitor for silicon etching

1980-12-31

1983-01-04

Rosenberger, R. A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356382, 156626, G01B 2108, G01B 1702

Patent

active

043670440

ABSTRACT:
An in situ thickness change monitor for determining thickness change in opaque product material, such as silicon, in chamber apparatus, such as reactive ion etching apparatus, operative to produce such thickness change. Reference material having thickness change properties, such as etch-rate, correlatable to the product material thickness change properties is deposited upon a substrate having an index of refraction such as to form a monitor exhibiting an optical discontinuity. With the monitor positioned within the chamber with the product material, light directed thereto acts to provide reflected beams producing light having an intensity variation due to interference indicative of the thickness of the reference material. Changes in the thickness of the reference material are correlated to changes in thickness of the product material.

REFERENCES:
patent: 3612692 (1971-10-01), Kruppa
patent: 3645623 (1972-02-01), Patten
patent: 3664942 (1972-05-01), Havas et al.
patent: 4039370 (1977-08-01), Kleinknecht
patent: 4147435 (1979-04-01), Habegger
patent: 4260259 (1981-04-01), Kirk
patent: 4293224 (1981-10-01), Gaston et al.
Groner et al., "Measurement of Deposition Rate in Matrix Spectroscopy with a Small Laser", J. Phys. E., vol. 6, No. 2, (Feb. 1972), pp. 122-123.
Logan et al., "In Situ Etch Rate Monitor/Etch End Point Detector for Opaque Materials", IBM Technical Disclosure Bulletin, vol. 21, No. 6, Nov. 1978, p. 2314.

Affiliated with

Also associated with

Rating

Situ rate and depth monitor for silicon etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Situ rate and depth monitor for silicon etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Situ rate and depth monitor for silicon etching will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1580704