Sintered high density silicon oxnitride and method for making th

Details Sintered high density silicon oxnitride and method for making th Sintered high density silicon oxnitride and method for making th

1988-04-28

1990-12-04

Dixon, Jr., William R.

Compositions: ceramic

Ceramic compositions

Refractory

521 98, 423325, C04B 3558

Patent

active

049753940

ABSTRACT:
A sintered silicon oxynitride composition comprises as an amount of starting material the combination of (a) a silicon component comprising silicon nitride(Si.sub.3 N.sub.4) and silicon oxide(SiO.sub.2) in a mol ratio of SiO.sub.2 /Si.sub.3 N.sub.4 being 0.7 to 1.2, and (b) at least one second component selected from an aluminum oxide, an aluminum nitride, a rare earth oxide, and a rare earth nitride, said second component being in an amount of from about 0.1 to 10 mol per 100 mol of said silicon component.

REFERENCES:
patent: Re28348 (1975-02-01), Washburn
patent: 3356513 (1967-12-01), Washburn
patent: 4818733 (1979-04-01), Shirai et al.

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