Sintered BI2TE3-based thermoelectric materials preventing P- to

Stock material or miscellaneous articles – All metal or with adjacent metals – Having metal particles

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

419 5, 419 7, 1362361, 136240, 136241, 136238, B22F 310, B22F 700

Patent

active

054879523

ABSTRACT:
There are sintered Bi.sub.2 Te.sub.3 -based thermoelectric materials containing Ag.sub.2 S, which prevent p- to n-type transition of Bi.sub.2 Te.sub.3 -based thermoelectric materials during polycrystalline sintering and have improved thermoelectric properties.

REFERENCES:
patent: 3853550 (1974-12-01), Nikolaev et al.
patent: 4029520 (1977-06-01), Hampl, Jr.
patent: 4489742 (1984-12-01), Moore et al.
patent: 4491679 (1985-01-01), Moore
patent: 4665276 (1987-05-01), Elbel et al.
patent: 5058061 (1991-10-01), Koshino et al.
patent: 5108515 (1992-04-01), Ohta et al.
patent: 5318743 (1994-06-01), Tokiai et al.
P. D. Delavignette, "Dislocation Nets in Bi.sub.2 Te.sub.3 and Sb.sub.2 Te.sub.3 ", Phil. Mag., 5, 729-44 (1960).
W. R. George, "The Sintering of Bi.sub.2 Te.sub.3 ", Proc. Phys. Soc., 74, 768-770 (1959).
P. C. Eklund et al., "Thermoelectric Power Measurement Using Analog Substraction" Rev. Sci Instrum., 48[7], 775-777 (1977).
T. C. Harman, "Special Techniques for Measurement of Thermoelectric Properties", J. Appl. Phys., 29, 1373-1374 (1958).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sintered BI2TE3-based thermoelectric materials preventing P- to does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sintered BI2TE3-based thermoelectric materials preventing P- to , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sintered BI2TE3-based thermoelectric materials preventing P- to will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-156093

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.