Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent
1995-06-08
1996-11-12
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
134147, 134153, 134902, 134200, B08B 310
Patent
active
055730230
ABSTRACT:
A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.
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Owczarz Aleksander
Thompson Raymon F.
Semitool Inc.
Stinson Frankie L.
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