Single-wafer-processing type CVD apparatus

Details Single-wafer-processing type CVD apparatus Single-wafer-processing type CVD apparatus

2003-07-14

2008-12-09

Zervigon, Rudy (Department: 1792)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C118S7230VE, C118S724000

Reexamination Certificate

active

07462245

ABSTRACT:
A single-wafer-processing type CVD apparatus for forming a thin film on an object to be processed includes a reaction chamber, a susceptor for placing the object thereon, a shower plate for emitting a jet of reaction gas to the object, which is set up in parallel and opposing to the susceptor, an orifice for bringing a liquid raw material and a carrier gas into the reaction chamber, which is formed through the ceiling of the reaction chamber, an evaporation plate means for vaporizing the liquid raw material, which is set up in a space between the ceiling of the reaction chamber and the shower plate, and a temperature controlling mechanism for controlling the shower plate and the evaporation plate means at respective given temperatures.

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