Single wafer megasonic semiconductor wafer processing system

Details Single wafer megasonic semiconductor wafer processing system Single wafer megasonic semiconductor wafer processing system

1991-12-18

1994-02-15

Kunemund, Robert

Fishing, trapping, and vermin destroying

437 10, 437946, 134 1, 134 2, 134 3, 134184, 134902, H01L 21302

Patent

active

052866572

ABSTRACT:
A semiconductor wafer processing system utilizing a specially constructed wet processing chamber for a single wafer and a megasonic, or high frequency, energy dispensing system. The construction of the container causes megasonic energy to become intensified near the surface of the wafer, thereby providing more cleaning power, and resulting cleaning. The megasonic device may be mounted on a bottom wall dump valve. Also, the energy output may be used to rotate a wafer.

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