Single wafer centrifugal dryer

Details Single wafer centrifugal dryer Single wafer centrifugal dryer

1986-12-10

1988-02-16

Schwartz, Larry I.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

34 8, 34184, F26B 1122

Patent

active

047246197

ABSTRACT:
The device according to this invention comprises a casing in which turns a device designed to support and hold the wafer, the said device is fitted eccentrically with respect to its rotational pin (3) a support element 5-6 designed to hold the silicon wafer by its edges in a horizontal plane, the device assembly being mounted in stable balance with respect to the said pin.

REFERENCES:
patent: 4313266 (1982-02-01), Tam
patent: 4637146 (1987-01-01), Motoki et al.

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