Single-substrate-heat-treatment apparatus in semiconductor proce

Details Single-substrate-heat-treatment apparatus in semiconductor proce Single-substrate-heat-treatment apparatus in semiconductor proce

1998-09-09

2000-06-27

Walberg, Teresa

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219411, 219390, 118725, A21B 100

Patent

active

060809655

ABSTRACT:
A single-substrate-heat-treatment apparatus heats a semiconductor wafer by scanning the wafer with light having high energy density. Light emitted by a light source is reflected by a reflection mirror mechanism, and is then focused on the surface of the wafer on a work table via a transparent window of a process chamber. During heat treatment, the work table or reflection mirror mechanism is moved to scan the wafer surface with the light coming from the light source.

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