Single-source molecular organic chemical vapor deposition agents

Details Single-source molecular organic chemical vapor deposition agents Single-source molecular organic chemical vapor deposition agents

1992-07-10

1994-09-06

Dees, Jose' G.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

556 1, 556 9, 556 14, 556173, 556174, 556176, 556181, 556182, 556186, 556178, 556136, 556137, 556138, 556146, 556 81, 556 42, 556 45, 556403, 568 1, 568 2, 568 6, 534 11, 534 15, C07F 700, C07F 702, C07F 902, C07F 500

Patent

active

053449487

ABSTRACT:
Neutral single-source molecular organic precursors containing tetradentate tripodal chelating ligands are provided that are useful for the preparation of films using chemical vapor deposition. These complexes can be generally represented by the formula ##STR1## wherein "M" is selected from the group consisting of a lanthanide, an actinide, a Group IIIA metal, a Group IIIA metalloid, a Group IVA metal, a Group IVA metalloid, a Group VA metal, a Group VA metalloid, a Group IIIB metal, a Group IVB metal, a Group VB metal, a Group VIB metal, a Group VIIB metal, and a Group VIIIB metal. The ligand "Z" can be present or absent, i.e., k=0-1, and is selected from the group consisting of hydrogen, halide, and a group bonded to "M" through N, O, P, S, As, Si, or C. In the tetradentate tripodal chelating ligand "E.sub.c " is N, P, or As, and m=0-1. When "E.sub.t " is N, P, or As, m=1, and when "E.sub.t " is O, S, or Se, m=0. Each "R.sup.1 " is independently selected from the group consisting of hydrogen, (C.sub.1 -C.sub.20)alkyl, (C.sub.2 -C.sub.20)alkenyl, (C.sub.2 -C.sub.20)alkynyl, (C.sub.6 -C.sub.18)aryl, (C.sub.7 -C.sub.20)aralkyl, a (C.sub.5 -C.sub.18)heterocycle, and triorganosilyl. In --[C(R.sup.2).sub.2 ].sub.n --, n=1-4, and each "R.sup.2 " is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, aryl, aralkyl, and a heterocycle.

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