Single piece slotted ferromagnetic sputtering target and sputter

Details Single piece slotted ferromagnetic sputtering target and sputter Single piece slotted ferromagnetic sputtering target and sputter

1997-07-25

1998-10-27

Nuzzolillo, M.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429813, 20429819, 2041922, C23C 1434, C23C 1435

Patent

active

058274146

ABSTRACT:
Disclosed is a target for a ferromagnetic sputtering apparatus formed of a single piece of ferromagnetic target material. The target has a circular central area, an annular outer area, and a plurality of interconnected slots of specified width in the single piece extending in circumferential directions about the central area, forming a plurality of specified width radial gaps between the circular central area and the annular outer area. The slots of the sputtering target may be arranged to provide tabs crossing the slots to provide structural support to the specified width slots.

REFERENCES:
patent: 4200510 (1980-04-01), O'Connell et al.
patent: 4299678 (1981-11-01), Meckel
patent: 4401546 (1983-08-01), Nakamura et al.
patent: 4412907 (1983-11-01), Ito et al.
patent: 4834860 (1989-05-01), Demaray et al.
patent: 5632869 (1997-05-01), Hurwitt et al.

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