Single piece pod shield for vertical plenum wafer processing...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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C204S192120, C204S298280

Reexamination Certificate

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06837974

ABSTRACT:
A replacement chamber shield is provided for a wafer processing machine that replaces many prior art shield components with a single piece shield. The shield is particularly suitable for use in a processing chamber of a vacuum processing machine of a type for processing a wafer in a vertically-oriented split-plenum, such as machines of the type described in U.S. Pat. Nos. 4,909,695 and 4,915,564 and the machine marketed under the trademark ECLIPSE MARK II by Tokyo Electron Limited. The shield is formed of sheet material formed into an axially-extending cylindrical sidewall that turns radially inwardly into an annular shoulder that oppositely turns into an at least partially axially-extending section that further turns oppositely back radially inwardly into an annular disc having a central circular opening that is larger in diameter than the given wafer diameter. Advantageous dimensions and geometric relationships to components of the machine are described and claimed.

REFERENCES:
patent: 4909695 (1990-03-01), Hurwitt et al.
patent: 4915564 (1990-04-01), Eror et al.
patent: 5516732 (1996-05-01), Flegal
patent: 5658442 (1997-08-01), Van Gogh et al.
patent: 5820329 (1998-10-01), Derbinski et al.
patent: 6143147 (2000-11-01), Jelinek
patent: 6258228 (2001-07-01), Reiss
patent: 6645357 (2003-11-01), Powell
Publication No. US 2002/O064450 A1.Coomer et al.,Pub. Date: May 30, 2002.

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