Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2008-05-20
2008-05-20
McDonald, Rodney G. (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298110, C204S298080, C204S192100, C204S192120, C118S7230IR, C118S7230IR, C156S345480
Reexamination Certificate
active
10880172
ABSTRACT:
The invention includes a coil support assembly having an insulator interfacing a surface of a shield disposed within a processing chamber. The insulator has an extension which extends through the shield. A second insulator is disposed between the shield and a coil and contacts a protrusion extending from the coil. A fastener is disposed through the first insulator and extends through the second insulator and into the protrusion. The fastener is electrically isolated from the shield by the first insulator. The invention includes coil assemblies containing the described coil support configuration. The invention further includes a method of supporting a coil within a processing chamber having a shield disposed therein. Insulators are inserted to extend from an outer side of the shield through a thickness of the shield. A coil is mounted within the chamber by inserting fasteners through each insulator into bosses which-protrude outwardly from the coil body.
REFERENCES:
patent: 6235163 (2001-05-01), Angelo et al.
patent: 1 067 584 (2001-01-01), None
patent: 1 130 624 (2001-09-01), None
patent: WO 2004/033742 (2004-04-01), None
patent: WO 2004/079764 (2004-09-01), None
patent: WO 2005/001918 (2005-01-01), None
Amador Gilbert
Chan David K.
Hom Len
Kang Peter J.
Mize John D.
Honeywell International , Inc.
McDonald Rodney G.
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