Single phase fluid imprint lithography method

Details Single phase fluid imprint lithography method Single phase fluid imprint lithography method

2006-08-15

2006-08-15

Smith, Duane (Department: 1724)

Gas separation: processes

Degasification of liquid

Plural successive degassing treatments

C095S263000, C096S193000, C096S202000, C427S350000, C427S377000, C264S085000, C264S102000, C430S327000, C438S909000, C425S210000, C425S815000, C425SDIG060

Reexamination Certificate

active

07090716

ABSTRACT:
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.

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