Single laser exposure and monitoring of holograms

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350 383, G03H 110

Patent

active

H00008419

ABSTRACT:
A system in which the light of a single laser is used to both expose a hologram and to simultaneously measure the formation of the hologram in the recording material.

REFERENCES:
patent: 4125314 (1978-11-01), Haskell et al.
patent: 4252400 (1981-02-01), Bernal et al.
patent: 4458978 (1984-07-01), Arns et al.
patent: 4602849 (1986-07-01), Nicholson
patent: 4738498 (1988-04-01), Baba
K. Booth, Photopolymer Material for Holography; Mar. 1975 pp. 593-601. Aped Optics vol. 14. No. 3.
W. S. Colburn et al., Volume Hologram Formation in Photopolymer Materials; Jul. 1971 pp. 1636-1641. Applied Optics.
Bruce L. Booth, Photopolymer Laser Recording Materials, Winter 1977, Journal of Applied Photographic Engineering vol. 3, No. 1 pp. 24-30.
Christoph Brauchle and Donald M. Burlard, Holographic Methods for the Investigation of Photochemical and Photophysical Properties of Molecules; Argeur Chem. Int. Engl 22 (1983) pp. 582-598.
G. C. Bjorklund et al.; A Holographic Technique for Investigating Photochemical Reactions; J. Chem. Phys 73(9) 1 Nov. 1980 pp. 4321-4328.
D. M. Burland and Chr. Brauchle; The Use Of Holography To Investigate Complex.
Photochemical Reations, J. Chem. Phys. 76 (9), 1 May 1982 pp. 4502-4512.
Yoshiaki Nakano and Kunio Tada, In Situ Monitoring Technique for Fabrication of High-Quality Diffraction Gratings, Optics Letters Jan. 1988/vol. 13 No. 1, pp. 7-9.

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