Single ended ultra-high vacuum chemical vapor deposition (UHV/CV

Details Single ended ultra-high vacuum chemical vapor deposition (UHV/CV Single ended ultra-high vacuum chemical vapor deposition (UHV/CV

1990-06-13

1993-01-26

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118733, C23C 1600

Patent

active

051819643

ABSTRACT:
An ultra-high vacuum chemical vapor deposition reactor which utilizes only a single large diameter, quartz to metal ultra-high vacuum seal or a water cooled viton seal, which is present at a first end of the reactor tube. The other end of the reactor tube has a substantially reduced diameter, and an ultra-high vacuum seal of correspondingly reduced diameter is used at this end. The pumping apparatus and the load station are both located at the first end of the apparatus to provide a single-ended operation.

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