Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Patent
1998-08-31
2000-06-27
Hiteshew, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
117 31, 117217, C30B 1520
Patent
active
060802383
ABSTRACT:
After whole raw material filled in a crucible is melted by plural heaters provided around the crucible, outputs of the heaters are lowered so that molten liquid is maintained at a predetermined temperature. A seed crystal is brought into contact with a surface of the molten liquid, and while a height of the surface of the molten liquid is being maintained in a heating region of a topmost heater, a pulling shaft is pulled up at a predetermined speed so that a single crystal is grown in a lower position of the seed crystal. At this time, in order that the pulled single crystal has required oxygen concentration during the pulling of the single crystal, a ratio of the output of the topmost heater to the outputs of all the heaters is set to a value calculated by R.sub.PW .gtoreq.0.88R.sub.T (R.sub.PW : output ratio of the topmost heater) based on the ratio R.sub.T of the height of the topmost heater to the height of the crucible.
REFERENCES:
patent: 5363796 (1994-11-01), Kobayashi et al.
patent: 5766347 (1998-06-01), Shimomura et al.
patent: 5853480 (1998-12-01), Kubota et al.
"Single Crystal Growing Apparatus," Electronic Material, Extra Issue, Makoto Ito et al., Dec. 1995.
Hiteshew Felisa
Sumitomo Sitix Corporation
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