Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Patent
1997-01-29
1999-04-20
Hiteshew, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
65 173, 65144, C30B 3500
Patent
active
058955275
ABSTRACT:
The invention relates to a single crystal pulling apparatus comprising; an outer crucible 11 positioned inside a chamber (gas tight container) 2, for storing a semiconductor melt 21, and an inner crucible 30 comprising a cylindrical partition body, mounted inside the outer crucible 11 to form a double crucible, and wherein a single crystal of semiconductor 26 is pulled from the semiconductor melt 21 stored inside the inner crucible 30. With this arrangement, the inner crucible 30 is made from quartz and comprises an inside layer A, an outside layer C, and an intermediate layer B which lies between the inside layer A and the outside layer C, and the intermediate layer B is made from quartz with a larger gas bubble content than the quartz which makes up the inside layer A and the outside layer C of the inner crucible 30.
REFERENCES:
patent: 4416680 (1983-11-01), Bruning et al.
patent: 4528763 (1985-07-01), Albrecht
patent: 4632686 (1986-12-01), Brown et al.
patent: 5306473 (1994-04-01), Nakajima et al.
Atami Takashi
Fukui Masanori
Furuya Hisashi
Kida Michio
Taguchi Hiroaki
Hiteshew Felisa
Mitsubishi Materials Corporation
Mitsubishi Materials Quartz Corporation
Mitsubishi Materials Silicon Corporation
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