Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Patent
1997-01-10
1998-11-24
Garrett, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
117 19, 117 30, 117 31, 117 33, C30B 1504
Patent
active
058401156
ABSTRACT:
A method of growing a single crystal of semiconductor using a CZ growth technique, having a step (0<t<t1) wherein a single crystal of semiconductor is pulled while a source material is supplied continuously to maintain a constant amount of semiconductor melt, and a step (t2<t<t3) wherein the supply of source material is halted, and the single crystal of semiconductor is pulled using residual melt from the first step.
REFERENCES:
patent: 5485802 (1996-01-01), Alteknuger et al.
patent: 5488924 (1996-02-01), Horvath et al.
patent: 5690723 (1997-11-01), Napai et al.
Atami Takashi
Furuya Hisashi
Kida Michio
Taguchi Hiroaki
Friedman Mark M.
Garrett Felisa
Zag Ltd.
LandOfFree
Single crystal growth method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Single crystal growth method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Single crystal growth method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1698221