Single-chamber cleaning, rinsing and drying apparatus and method

Details Single-chamber cleaning, rinsing and drying apparatus and method Single-chamber cleaning, rinsing and drying apparatus and method

1992-07-30

1994-04-12

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134108, 134111, 134902, D06B 304

Patent

active

053017013

ABSTRACT:
A machine that performs the steps of cleaning, rinsing and drying required prior to further processing in the course of conventional semiconductor fabrication in a single, hermetically and thermally insulated, process chamber. The machine consists of functionally compartmentalized sections connected to the process chamber for each specific function, comprising a cleaning-solution storage and circulation section, a rinsing fluid storage and circulation section, and a vacuum drying section. After enclosing the semiconductor product hermetically in the process chamber, a cleaning solution from an internal holding source is heated and circulated through it for the cleansing step, followed by purified water to rinse the cleaning fluid off the surface of the semiconductor material. A vacuum is then applied to completely remove any residue of rinsing water left on the wafers. Control options permit a user to adapt the wash-rinse-dry cycles to the specifications of the chemicals being used for the particular products being processed.

REFERENCES:
patent: 3727620 (1973-04-01), Orr
patent: 4197000 (1980-04-01), Blackwood
patent: 4816081 (1989-03-01), Mehta et al.
patent: 4827867 (1989-05-01), Takei et al.
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4977688 (1990-12-01), Roberson, Jr. et al.
patent: 5039349 (1991-08-01), Schoeppel
patent: 5201958 (1993-04-01), Breunsbach et al.

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