Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1990-08-27
1991-10-22
Tung, T.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
20429807, 20429809, 20429812, 20419211, 156345, 42218604, 42218622, 42218625, 42218629, 42218630, 422 31, C10G 3500
Patent
active
050592920
ABSTRACT:
A single-chamber apparatus and method are described for in-situ generation of dangerous polyatomic gases and radicals from solid or liquid source materials contained within a porous foamed structure. A cooled cathode is provided for establishing a plasma discharge within the chamber, and a heat source is provided to maintain the porous foamed structure within a fixed temperature range chosen such that the source material is removed from the porous foamed structure by evaporation induced by heat from the heat source while at the same time preventing consumption by evaporation of the porous foamed structure itself.
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Naitoh et al., "MoCVD Growth of InP Using Red-Phosphorous and Hydrogen Plasma" Jap. Journal of Applied Physics, vol. 26, pp. L1538-L1539.
Collins George J.
McNeil John R.
Yu Zeng-gi
Gorgos Kathryn
Hein William E.
Tung T.
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