Simultaneous, two-sided projection lithography system

Details Simultaneous, two-sided projection lithography system Simultaneous, two-sided projection lithography system

1997-07-08

1999-07-13

Rutledge, D.

Photocopying

Projection printing and copying cameras

Photographing on both sides of photo-sensitive paper

355 53, G03B 2732

Patent

active

059234032

ABSTRACT:
This projection imaging system is capable of simultaneously exposing both the upper and lower sides of a substrate while providing high-resolution, a large exposure area, and high exposure throughput. The system comprises:

REFERENCES:
patent: 3937579 (1976-02-01), Schmidt
patent: 4190352 (1980-02-01), Bruning
patent: 4537478 (1985-08-01), Richter
patent: 4721980 (1988-01-01), Yazaki
patent: 4924257 (1990-05-01), Jain
patent: 5258808 (1993-11-01), Watanuki
patent: 5272502 (1993-12-01), Saiki
patent: 5285236 (1994-02-01), Jain
patent: 5652645 (1997-07-01), Jain

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