X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-04-24
2007-04-24
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000
Reexamination Certificate
active
11178142
ABSTRACT:
Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Continuous X-rays are incident into the crystal and reflection intensities of the X-rays reflected from the crystal with different orders of reflections are measured based on Bragg's law, thereby measuring reflectivity of X-rays with different orders of reflections.
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Bak Jun Gyo
Bitter Manfred
Lee Sang Gon
Cantor & Colburn LLP
Glick Edward J.
Kiknadze Irakli
Korea Basic Science Institute
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