Simultaneous double sides polishing method

Details Simultaneous double sides polishing method Simultaneous double sides polishing method

1992-02-20

1994-11-15

Pianalto, Bernard

Coating processes

Magnetic base or coating

Magnetic coating

427128, 427132, 427209, 427240, 427328, 4274432, 427444, H01F 1002

Patent

active

053646550

ABSTRACT:
A thin plate such as a magnetic disk substrate is rotatably placed in a hole of a carrier provided between upper and lower surface plates forming a dynamic pressure producing surface in a temperature-controlled polishing liquid. When the number of revolutions of the surface plates increases, the dynamic pressure effect of the polishing agent is produced between the surface-plate surface and the substrate surface so that the substrate is polished in the non-contact state with the surface plate. The substrate surface is polished by fine free abrasive grains in the polishing liquid flowing between the surface plate and the substrate to provide a high plane degree to which surface precision of the surface plate is transferred. The present invention makes employs a float polishing, and is particularly suit to surface polishing of a thin plate such as a magnetic disk substrate which resets a residual processed strain. A magnetic disk having an excellent surface state can be realized.

Affiliated with

Also associated with

Rating

Simultaneous double sides polishing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Simultaneous double sides polishing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Simultaneous double sides polishing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1095881