Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2008-08-07
2011-11-29
Bhatnagar, Anand (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C382S280000, C716S050000, C716S051000, C716S052000, C716S053000, C716S054000, C716S055000, C430S005000, C430S014000, C430S030000
Reexamination Certificate
active
08068663
ABSTRACT:
The intensity distribution of an optical image in a resist film is calculated (S1); the intensity distribution of the optical image is transformed through a Fourier transform in a periodic direction of the intensity distribution of the optical image (S2) and is transformed through a spectral transform in an aperiodic direction of the intensity distribution of the optical image by use of a base which satisfies a boundary condition (S3); a modulation function for modulating the intensity distribution of the optical image is transformed through a Fourier transform in the periodic direction (S4) and is transformed through a spectral transform in the aperiodic direction by use of the base satisfying the boundary direction (S5); a product of the post-transformed intensity distribution of the optical image and the post-transformed modulation function is computed (S6), is transformed through an inverse Fourier transform in the periodic direction (S7), and is transformed through an inverse spectral transform in the aperiodic direction by use of a base corresponding to the inverse transform of the spectral transform; and thereby a modulated intensity distribution of the optical image is calculated (S8).
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Takahashi Masanori
Tanaka Satoshi
Bhatnagar Anand
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Tsai Tsung-Yin
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