Simulation method in lithographic process

Details Simulation method in lithographic process Simulation method in lithographic process

1997-12-24

2000-04-11

Teska, Kevin J.

G06F 9455

Patent

active

060496606

ABSTRACT:
A simulation method for simulating in a lithographic process is disclosed, and the method can expect a size of a resist pattern by obtaining a diffused aerial image model(DAIM) by determining a simplified model in a aerial image to represent a resist process without simulating full processes including a resist process, and then applying the DAIM to a threshold model.

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Crisalle et al., A Comparison of the Optical Projection Lithography Simulators in SAMPLE and PROLITH, Feb. 1992, pp. 14-26.
Archak et al., Modeling of Resolution Enhancement Processes in Lithography, Sep. 1995, pp. 309-314.
Qian et al., A New Scalar Planewave Model for High NA Lithography Simulations, Mar. 1994, pp. 45-48.

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