Simulation based PSM clear defect repair method and system

Details Simulation based PSM clear defect repair method and system Simulation based PSM clear defect repair method and system

2005-08-09

2005-08-09

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06927003

ABSTRACT:
Mask shops typically use carbon to repair any clear defects identified on a mask, irrespective of the type of mask. However, carbon can have different characteristics than the original patterning material on the mask. Therefore, a mask that is repaired using carbon may not optically perform as if it were defect-free. An automated method of repairing a clear defect on an attenuated phase shifting mask (PSM) provides an optimized plug size/shape. In this method, a repair solution to the clear defect can be simulated, thereby allowing the repair decision for an attenuated PSM to be advantageously made at the same time that inspection is done and before actual repair. Simulation can include performing model-based OPC on the repair solution.

REFERENCES:
patent: 6578188 (2003-06-01), Pang et al.
patent: 2004/0151991 (2004-08-01), Stewart et al.

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