Simulation apparatus and method

Data processing: structural design – modeling – simulation – and em – Simulating electronic device or electrical system

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C703S025000

Reexamination Certificate

active

07865345

ABSTRACT:
Transaction-level simulation in which communication over a bus is performed by using a transaction. The transaction includes information indicating whether information is attribute information that is mapped to hardware and includes attribute information that is not mapped to hardware. The transaction is received, time information which is attribute that is not mapped to hardware is read from the transaction, and the result of the simulation based on the read time information is outputted.

REFERENCES:
patent: 5768500 (1998-06-01), Agrawal et al.
patent: 5958035 (1999-09-01), Carter et al.
patent: 6151567 (2000-11-01), Ames et al.
patent: 6272112 (2001-08-01), Orita
patent: 6434517 (2002-08-01), Le
patent: 6845341 (2005-01-01), Beverly et al.
patent: 7055116 (2006-05-01), Marschner et al.
patent: 2003/0154401 (2003-08-01), Hartman et al.
patent: 2004/0054500 (2004-03-01), Beverly et al.
patent: 2007/0162475 (2007-07-01), Jacobson et al.
patent: 2002-312416 (2002-10-01), None
patent: 2003-15968 (2003-01-01), None
patent: 2005-108007 (2005-04-01), None
Cochrane, Allan et al, AMBA AHB Cycle Level Interface (AHB CLI) Specification, released on Jul. 15, 2003, ARM Ltd. 2003.
Grounds for Rejection issued in corresponding Japanese patent application No. 2004-262953, dated Aug. 1, 2008.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Simulation apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Simulation apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Simulation apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2730130

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.