X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1998-09-08
1999-04-06
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 45, G21K 106
Patent
active
058928090
ABSTRACT:
A system for local excitation by monochromatic X-rays having a plurality of x-ray sources and a plurality of focussing diffractors to selectively monochromatize X-rays and focus them on a particular region of a sample to be analyzed. The X-ray source for each diffractor is selected from a plurality of closely-spaced sources by displacement of the focal spot of an electron beam that produces the X-rays. Each diffractor is prealigned to focus X-rays generated by the electron beam onto a common region of the sample. Each diffractor comprises a toroidally shaped crystal structure, which, along with the appropriate source and the common region of the specimen satisfies the Johann or Johansson geometric conditions within a plurality of planes containing both the source of X-rays and the focused X-ray image. Application of the system for local excitation to X-ray fluorescence analysis is described.
REFERENCES:
patent: 4599741 (1986-07-01), Wittry
patent: 4752945 (1988-06-01), Jenkens et al.
patent: 5173930 (1992-12-01), Hoover
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