Simplified pitch doubling process flow

Details Simplified pitch doubling process flow Simplified pitch doubling process flow

2007-05-03

2010-06-08

Richards, N Drew (Department: 2895)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S706000, C257SE21038, C257SE21039

Reexamination Certificate

active

07732343

ABSTRACT:
A method for fabricating a semiconductor device comprises patterning a layer of photoresist material to form a plurality of mandrels. The method further comprises depositing an oxide material over the plurality of mandrels by an atomic layer deposition (ALD) process. The method further comprises anisotropically etching the oxide material from exposed horizontal surfaces. The method further comprises selectively etching photoresist material.

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