Silver halide vapor deposition method

Details Silver halide vapor deposition method Silver halide vapor deposition method

1975-06-12

1978-10-31

Klein, David

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

427255, 427404, 427238, G03C 102, C23C 1300, B05B 1306, C03C 500

Patent

active

041232801

ABSTRACT:
There are disclosed a method and an apparatus for the production of photographic materials by vacuum deposition of silver halides on a continuously moving substrate. The silver halides are heated in a crucible placed within a vacuum chamber by radiant heating means disposed outside the chamber and the crucible is so shaped and positioned so close to the continuously moving substrate that a stream of silver halide vapour impinges perpendicularly on the substrate and silver halide is deposited on the substrate at a rate of 200 to 2000 A/sec. The substrate is usually primed with a layer of a material which enhances deposition of the silver halide thereon. The use of the photographic material thus produced in the production of direct positive and negatively emitting photographic materials is described.

REFERENCES:
patent: 2945771 (1960-07-01), Mansfeld
patent: 3219451 (1965-11-01), LuValle et al.
patent: 3544763 (1970-12-01), Geir
patent: 3775157 (1973-11-01), Fromson
Maissel and Glang-Thin Film Tech. Hdbk., Chap. 18, p. 17; Chap. 2, pp. 40-41, .COPYRGT.1970.

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