Silver halide photographic material having improved antistatic p

Details Silver halide photographic material having improved antistatic p Silver halide photographic material having improved antistatic p

1995-08-17

1996-04-02

Wright, Lee C.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430529, 430537, 430629, 430634, 430637, G03C 189

Patent

active

055039677

ABSTRACT:
The present invention relates to a silver halide photographic material comprising a support and at least one silver halide emulsion layer coated thereon, wherein said silver halide emulsion layer comprises from 5 to 15% by weight of a water-soluble, electrically conductive copolymer (1) containing carboxylic groups and sulfonic groups and wherein a hydrophilic colloid layer comprising a combination of a fluorinated surfactant (2), a non-ionic polyoxyethylene surfactant (3) and an anionic polyoxyethylene surfactant (4) is coated on said at least one silver halide emulsion layer.

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Abstract of German Patent No. 40 34 870 A, published May 7, 1992.
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Abstract of Japanese Patent, Application No. 62-32994, published Feb. 17, 1987, involving Sivler Halide Photographic Sensitive Material Sensitive Material invented by Haruhiko Sakuma.

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