Silver halide photographic material having improved antistatic p

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

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430523, 430637, G03C 185

Patent

active

055716652

ABSTRACT:
The present invention relates to a silver halide photographic material comprising a support, at least one silver halide emulsion layer coated thereon, and a hydrophilic colloid layer coated on said at least one silver halide emulsion layer, wherein said hydrophilic colloid layer comprises a combination of (a) at least one surfactant selected from the group consisting of non-ionic polyoxyethylene surfactants and anionic polyoxyethylene surfactants and (b) at least one surfactant selected from the group consisting of non-ionic perfluoroalkylpolyoxyethylene surfactants and polyoxyethylene-modified polysiloxane surfactants.

REFERENCES:
patent: 3850640 (1974-11-01), Babbit et al.
patent: 4367283 (1983-01-01), Nakayama et al.
patent: 4582781 (1986-04-01), Chen et al.
patent: 4596766 (1986-06-01), Nemori et al.
patent: 4610955 (1986-09-01), Chen et al.
patent: 4649102 (1987-03-01), Mukunoki et al.
patent: 4847186 (1989-07-01), Mukunoki et al.
patent: 4891307 (1990-01-01), Mukunoki et al.
patent: 5037871 (1991-08-01), Jones
patent: 5137802 (1992-08-01), Ueda et al.

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