Radiation imagery chemistry: process – composition – or product th – Silver halide colloid tanning process – composition – or product
Patent
1990-11-15
1992-04-28
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Silver halide colloid tanning process, composition, or product
430204, 430267, 430445, 430567, 430572, 430584, 430944, G03C 106
Patent
active
051088720
ABSTRACT:
A silver halide photographic material comprising a support having thereon at least one light-sensitive layer comprising a silver halide emulsion sensitized by an infrared sensitization dye, wherein the silver halide in the silver halide emulsion contains at least 90 mol % of silver chloride and is constituted by monodisperse grains having a coefficient of variation of not more than 20%; and an image formation method using the above-described silver halide photographic photosensitive material, comprising the steps of imagewise exposing the photographic material and developing the said material in a developing solution containing at least 0.15 mol/l of sulfurous acid ions and a compound having a silver halide-adsorption accelerating group.
REFERENCES:
patent: 4536473 (1985-08-01), Mihara
patent: 4596767 (1986-06-01), Mihara et al.
patent: 4670377 (1987-06-01), Miyoshi et al.
patent: 4770961 (1988-09-01), Tanaka et al.
patent: 4833064 (1989-05-01), Okutsu et al.
patent: 4873170 (1989-10-01), Nishinoiri et al.
patent: 5059508 (1991-10-01), Vaes et al.
Inoue Nobuaki
Saeki Naomi
Yagihara Morio
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Neville Thomas R.
LandOfFree
Silver halide photographic material and method of forming images does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silver halide photographic material and method of forming images, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide photographic material and method of forming images will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1248610