Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1988-09-22
1990-05-08
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430520, 430531, 430551, 430564, 430613, 430614, 430640, 430644, G03C 726, G03C 137
Patent
active
049237900
ABSTRACT:
A silver halide photographic material composed of a support having thereon at least one light-sensitive silver halide emulsion layer, wherein the material contains the combination of (i) at least one compound represented by formula (I) and (ii) and at least one compound represented by formulae (II) and/or (III): ##STR1## wherein R.sub.1 represents hydrogen, an alkyl group, an aryl group or an aralkyl group; X represents a halogen atom, a nitro group, a hydroxyl group, a cyano group, a lower alkyl group, a lower alkoxy group, --COR.sub.2, ##STR2## or --SO.sub.3 M; R.sub.2 represents hydrogen, --OM, a lower alkyl group, an aryl group, an aralkyl group, a lower alkoxy group, an aryloxy group, an aralkyloxy group or ##STR3## R.sub.3 and R.sub.4 each represents hydrogen, a lower alkyl group, an aryl group, an aralkyl group, --COR.sub.7 or --SO.sub.2 R.sub.7 ; R.sub.5 and R.sub.6 each represents hydrogen, a lower alkyl group, an aryl group or an aralkyl group; R.sub.7 represents a lower alkyl group, an aryl group or an aralkyl group, M represents hydrogen, an alkali metal atom or atoms necessary for forming a monovalent cation, m represents 0 or an integer of 1 to 4, n represents 0 or an integer of 1 to 4, and Z represents an atomic group necessary for forming a thiazolyl ring; ##STR4## where in R.sub.8 represents a lower alkylene group, X is the same as X in formula (I), p represents 0 or 1, and q represents 0 or an integer of 1 to 5; ##STR5## wherein R.sub.9 represents hydrogen, an alkyl group, an alkenyl group, an aralkyl group, an aryl group, a heterocyclic group, ##STR6## R.sub.10 and R.sub.11 each represents hydrogen, an alkyl group, an aryl group, a cyano group, a heterocyclic group, an alkylthio group, an arylthio group, an alkylsulfonyloxy group or an alkylsulfonyl group; R.sub.10 and R.sub.11 may be linked to form an aromatic ring; and R.sub.12 and R.sub.13 each represents hydrogen, an alkyl group, an aryl group or an aralkyl group. The material has superior antifungal and antibacterial properties.
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Aikawa Kazuhiro
Kato Hirohiko
Mihayashi Keiji
Chea Thorl
Fuji Photo Film Co. , Ltd.
Michl Paul R.
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