Silver halide photographic light-sensitive material using antist

Details Silver halide photographic light-sensitive material using antist Silver halide photographic light-sensitive material using antist

1994-02-25

1994-11-15

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430523, 430531, G03C 185

Patent

active

053647513

ABSTRACT:
A plastic film material comprising a layer is disclosed, the layer containing in admixture a binder and particles comprising a compound in an amount of 70% or more by weight of the particles, the particles having a volume specific resistance of not more than 10.sup.9 .OMEGA.cm and the compound comprising an element selected from the group consisting of H, B, C, N, O, F, P, S and Cl.

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patent: 3835102 (1974-09-01), Shinohara et al.
patent: 3963498 (1976-06-01), Trevoy
patent: 4914718 (1990-04-01), Besio et al.
patent: 4948720 (1990-08-01), Chen et al.
patent: 4971897 (1990-11-01), Chen et al.
patent: 5128233 (1992-07-01), Beisswenger et al.
patent: 5244773 (1993-09-01), Muramatsu et al.
Patent Abstracts of Japan, vol. 10 No. 139 (C-348) (2196); May 22, 1986 JPA-61-000,256; Jan. 6, 1986.

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