Silver halide photographic light-sensitive material inhibited in

Details Silver halide photographic light-sensitive material inhibited in Silver halide photographic light-sensitive material inhibited in

1990-02-20

1991-09-03

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430527, 430624, G03C 135

Patent

active

050454412

ABSTRACT:
A silver halide photographic light-sensitive material is disclosed, which is inhibited in forming pin-holes in a phgotomechanical processes. The light-sensitive material comprises a support on a surface of which an electric conductive layer is provided. The electric conductive layer comprises a polymer having an aromatic ring or a heterocyclic ring each having a sulfonic acid group or a salt bonding to the aromatic or heterocyclic ring directly or through a divalent group, and a latex. This layer has a swelling degree of from 0.2 percent to 300 percent.

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Research Disclosure, No. 162, Oct. 1977, Emsworth, Hants, England, G. A. Campbell et al., "Sulfonated Anionic Microgel Latices Useful as Antistatic Agents", pp. 47-49.

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