Silver halide photographic light-sensitive material for photomec

Details Silver halide photographic light-sensitive material for photomec Silver halide photographic light-sensitive material for photomec

1983-08-17

1985-11-05

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Silver halide colloid tanning process, composition, or product

Process using lithographic infectious developer

430264, 430266, 430949, 430533, G03C 148

Patent

active

045514127

ABSTRACT:
A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and the light-insensitive upper layer contains a polymer latex.
The silver halide photographic light-sensitive material has excellent aptitude for reduction treatment without increasing the amount of silver per unit area. The occurrence of reticulation is prevented with the silver halide photographic light-sensitive material.
A method of reduction treatment for a silver halide photographic light-sensitive material for photo-mechanical process comprising the steps of: exposing the silver halide photographic light-sensitive material as described above, development processing the exposed silver halide photographic light-sensitive material to form a silver image, and carrying out reduction treatment of the silver image is also disclosed.

REFERENCES:
patent: 3142568 (1964-07-01), Nottorf
patent: 3411911 (1968-11-01), Dykstra

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