Silver halide photographic light-sensitive material

Details Silver halide photographic light-sensitive material Silver halide photographic light-sensitive material

1992-07-08

1994-04-05

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430527, 430936, G03C 185

Patent

active

053004167

ABSTRACT:
There is disclosed a silver halide photographic light-sensitive material which is improved in an antistatic property, curling before and after processing, and surface status after processing. The light-sensitive material includes a support having provided thereon at least one light-sensitive silver halide emulsion layer, wherein the material contains an anionic crosslinked polymer dispersion containing a polymer represented by Formula (I), and the material further contains an anionic water soluble polymer represented by Formula (II): ##STR1## wherein A represents a repetitive unit formed by copolymerizing a crosslinking monomer having at least two copolymerizable ethylenically unsaturated groups; B and E each represent a monomer unit formed by copolymerizing copolymerizable ethylenically unsaturated monomers; R.sup.1 represents a hydrogen atom, a substituted or unsubstituted lower alkyl group, or a halogen atom; L represents a di- to tetravalent linkage group; M represents a hydrogen atom or a cation; m represents 0 or 1; n represents 1, 2 or 3; D represents a monomer unit formed by copolymerizing at least one monomer selected from the group consisting of N,N-dimethylacrylamide, N-acryloylmorpholine and N-acryloylpiperidine; x, y, z, x', y', and z' each represent a percentage of a monomer component, provided that x is from 1 to 70, y is from 0 to 50, z is from 25 to 90, x' is from 1 to 99, y' is from 0 to 50, and z' is from 1 to 99, wherein x+y+z= 100 and x'+y'+z'= 100.

REFERENCES:
patent: 5104779 (1992-04-01), Saverin et al.

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