Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Reexamination Certificate
2005-03-29
2005-03-29
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
C430S529000, C430S523000, C430S634000, C430S636000
Reexamination Certificate
active
06872515
ABSTRACT:
A silver halide photographic light-sensitive material having one or more layers including at least one light-sensitive silver halide emulsion layer on a support, wherein at least one of the layers contains at least one compound represented by R1-Z1(R1is an unsubstituted or hydroxy-substituted alkyl having 6-24 carbon atoms or an unsubstituted alkenyl group having 6-24 carbon atoms, and Z1is OSO3M or SO3M, where M is a cation) and a fluorine-containing surfactant. There is provided a silver halide photographic light-sensitive material that shows superior antistatic property and can be stably produced.
REFERENCES:
patent: 4347308 (1982-08-01), Takeuchi et al.
patent: 4367283 (1983-01-01), Nakayama et al.
patent: 4847187 (1989-07-01), Ono et al.
patent: 4968599 (1990-11-01), Pitt et al.
patent: 5503967 (1996-04-01), Furlan et al.
patent: 6589723 (2003-07-01), Yamanouchi et al.
patent: 6803180 (2004-10-01), Nagahara et al.
patent: 20030138745 (2003-07-01), Yanagi et al.
patent: 20030211430 (2003-11-01), Ikeda et al.
patent: 20040002024 (2004-01-01), Yanagi et al.
Tsukada Yoshihisa
Yanagi Terukazu
Yokota Kouichi
LandOfFree
Silver halide photographic light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silver halide photographic light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide photographic light-sensitive material will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3437101