Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1994-12-08
1996-08-06
Jordan, Charles T.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430527, 430530, 430630, 430529, 430531, 430631, G03C 176
Patent
active
H00015784
ABSTRACT:
A silver halide photographic light-sensitive material is disclosed. The light-sensitive material comprises a support having thereon a silver halide emulsion layer and optionally a hydrophilic colloid layer, at least one of said emulsion layer and said hydrophilic colloid layer contains a water-soluble polymer which comprises repeating unit represented by formula 1 in an amount of 10 to 100 mol %, and a electric conductive layer being provided between the support and the silver halide emulsion layer and comprising a binder and fine particles of an electric conductive crystalline metal oxide of ZnO, Ti0.sub.2, SnO.sub.2, Al.sub.2 O.sub.3, In.sub.2 O.sub.3, SiO.sub.2, MgO, BaO, MoO.sub.3, V.sub.2 O5 or a mixture thereof, each of which has a volumetric resistivity of not higher than 10.sup.7 .OMEGA.m; ##STR1## wherein R.sup.1 and R.sup.2 are each independently a hydrogen atom, an alkyl group, a halogen atom or a --CH.sub.2 COOM.sup.1, in which M.sup.1 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms; L is --CONH--, --NHCO--, --COO--, --OCO--, --SO.sub.2 --, --HSO.sub.2 --, --SO.sub.2 NH-- or --O--; J is an alkylene group, an arylene group or an aralkylene group; Q is a hydrogen atom, --R.sup.3, ##STR2## in which M.sup.2 is a hydrogen atom or a cation; R.sup.9 is an alkyl group having 1 to 4 carbon atoms; R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group, a phenyl group, an aralkyl group; X is an anion; M is a hydrogen atom or a cation; p and q are each 0 or 1; and Y is a hydrogen atom or a --(L).sub.p --(J).sub.q --Q group. The light-sensitive material has a good antistatic property without fogging due to a ultra rapid processing.
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Hardee John R.
Jordan Charles T.
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