Silver halide photographic light-sensitive material

Details Silver halide photographic light-sensitive material Silver halide photographic light-sensitive material

1982-08-25

1984-07-17

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Post imaging processing

Developing

430539, 430496, 430621, 430622, 430961, G03C 130

Patent

active

044606800

ABSTRACT:
A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer is disclosed. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and the thickness of the light-insensitive uppermost layer is from 1.3 .mu.m to 5.0 .mu.m. The silver halide photographic light-sensitive material has an improved covering power and results in remarkably low degree of reticulation. Furthermore, when the material is used it results in a reduced amount of scum being formed in the processing solution.

REFERENCES:
patent: 3689274 (1972-09-01), Sobel et al.
patent: 4047957 (1977-09-01), De Winter et al.
patent: 4161407 (1979-07-01), Campbell
patent: 4193795 (1980-03-01), Campbell et al.
patent: 4264719 (1981-04-01), Kameoka et al.
patent: 4266010 (1981-05-01), Nagatomo et al.
T887,012 Defensive Publication Abstract 8270.G.6 Published Jun. 1, 1971.
Farnell, et al., The Covering Power of Photographic Silver Deposits I Chem. Development, The Journal of Photographic Science, vol. 18, 1970 pp. 94-101.

Affiliated with

Also associated with

Rating

Silver halide photographic light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silver halide photographic light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide photographic light-sensitive material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1491412