Silver halide photographic light-sensitive material

Details Silver halide photographic light-sensitive material Silver halide photographic light-sensitive material

1988-12-28

1990-04-03

Van Le, Hoa

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430523, 430537, 430631, 430961, G03C 176

Patent

active

049140124

ABSTRACT:
A silver halide photographic light-sensitive material having excellent scratch resistance is disclosed. The photographic light-sensitive material comprises a support having thereon at least two hydrophilic colloid layers, wherein at least one of the layers is a photosensitive silver halide emulsion layer, and at least one of the layers contains composite latex comprising polymeric acrylic acid ester and/or polymeric methacrylic acid ester, and colloidal silica.

REFERENCES:
patent: 3856527 (1974-12-01), Hamb et al.
patent: 4232117 (1980-11-01), Naoi et al.
patent: 4363871 (1982-12-01), Shibue et al.
patent: 4499179 (1985-02-01), Ota et al.
patent: 4542088 (1985-09-01), Kojima et al.
patent: 4777113 (1988-10-01), Inoue et al.

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