Silver halide photographic light-sensitive material

Details Silver halide photographic light-sensitive material Silver halide photographic light-sensitive material

1992-02-03

1992-08-18

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Two or more radiation-sensitive layers containing other than...

430522, 430552, 430553, G03C 184, G03C 726, G03C 734

Patent

active

051399300

ABSTRACT:
A silver halide photographic light-sensitive material which contains, on a support, a compound represented by the following Formula [I]: ##STR1## wherein R.sub.1 is alkyl, cycloalkyl, aryl, heterocyclic, alkoxy, aryloxy, alkylamino or arylamino;

REFERENCES:
patent: 2274782 (1942-03-01), Gaspar
patent: 2533472 (1950-12-01), Keyes et al.
patent: 2956879 (1960-10-01), Van Campen
patent: 3148187 (1964-09-01), Heseltine
patent: 3177078 (1965-04-01), Bockly et al.
patent: 3247127 (1966-04-01), Bailey
patent: 3540887 (1970-11-01), Depoorter et al.
patent: 3575704 (1971-04-01), Salesin
patent: 3653905 (1972-04-01), None
patent: 3718472 (1973-02-01), Oliver et al.
patent: 3746546 (1973-07-01), Tsuji et al.
patent: 3865187 (1975-02-01), Kobayashi et al.
patent: 3932188 (1976-01-01), Tanaka et al.
patent: 3989528 (1976-11-01), Sugiyama
patent: 4070352 (1978-01-01), Maner et al.
patent: 4071312 (1978-01-01), Blackwell
patent: 4130430 (1978-12-01), Sugiyama et al.
patent: 4179294 (1979-12-01), Sugiyama et al.
patent: 4500635 (1985-02-01), Aoki et al.
patent: 4513079 (1985-04-01), Sakanoue et al.
patent: 4892812 (1990-01-01), Kohmura et al.

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