Silver halide light-sensitive material containing base precursor

Details Silver halide light-sensitive material containing base precursor Silver halide light-sensitive material containing base precursor

1995-04-25

1996-09-10

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Diffusion transfer process, element, or identified image...

430215, 430264, 4302711, 4302811, 430617, 430627, 430638, 430955, G03C 808, G03C 840, G03C 1498, G03F 706

Patent

active

055544827

ABSTRACT:
A silver halide light-sensitive material is disclosed. The light-sensitive material comprises a support and two or more layers. Silver halide, a reducing agent, an ethylenically unsaturated polymerizable compound or a cross-linkable polymer and a base precursor are independently contained in at least one of the layers. A layer containing the base precursor further contains a specific polyvinyl alcohol. The first embodiment of the specific polyvinyl alcohol (I) has such a chemical structure that a terminal alkyl group having 4 or more carbon atoms is attached to a polyvinyl alcohol. The second embodiment of the specific polyvinyl alcohol (II) is a block copolymer consisting of a vinyl alcohol unit and a hydrophobic unit, which is more hydrophobic than the vinyl alcohol unit. The third embodiment is a mixture of two polyvinyl alcohols (III) and (IV). The polyvinyl alcohol (III) has a saponification degree of not less than 95%. The polyvinyl alcohol (IV) has a saponification degree of less than 95% and a block character of not more than 0.5.

REFERENCES:
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patent: 5290659 (1994-03-01), Takeda
patent: 5304454 (1994-04-01), Yokoya et al.
patent: 5326667 (1994-07-01), Yokoya et al.
patent: 5328800 (1994-07-01), Yokoya et al.
Encyolopedia of Polymer Science and Engineering, vol. 17, pp. 167-198, John Wiley & Sons, Inc., 1989.

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