Silver halide light-sensitive material comprising support, harde

Details Silver halide light-sensitive material comprising support, harde Silver halide light-sensitive material comprising support, harde

2000-02-29

2000-10-17

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Diffusion transfer process, element, or identified image...

430202, 430205, 4302731, 430617, 430954, G03C 808, G03C 840, G03C 852, G03C 802, G03F 7085

Patent

active

061329258

ABSTRACT:
A silver halide light-sensitive material comprises a support, a hardening layer and a light-sensitive layer in order. The light-sensitive layer contains silver halide and a hydrophilic polymer. The hardening layer or the light-sensitive layer contains a reducing agent. The hardening layer contains a mixture of a polymer (A) and a polymer (B). The mixture contains the polymer (A) in an amount of 5 to 70 wt. % and the polymer (B) in an amount of 30 to 95 wt. %. The polymer (A) comprises repeating units of (A1) in an amount of not less than 95 mol %. The polymer (B) comprises repeating units of (B1) in an amount of 10 to 90 mol % and repeating units of (B2) in an amount of 10 to 90 mol %. ##STR1##

REFERENCES:
patent: 4886739 (1989-12-01), Prezdziecki
patent: 5290659 (1994-03-01), Takeda
patent: 5554482 (1996-09-01), Yokoya et al.
patent: 5843619 (1998-12-01), Hoshi
patent: 5856062 (1999-01-01), Hoshi
patent: 5882838 (1999-03-01), Hoshi et al.
patent: 5998086 (1999-12-01), Hoshi

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