Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Two or more radiation-sensitive layers containing other than...
Patent
1997-09-09
2000-11-07
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Two or more radiation-sensitive layers containing other than...
430567, 430569, 430637, G03K 1035, G03C 104, G03C 106
Patent
active
061434833
ABSTRACT:
There is disclosed a silver halide emulsion that comprises at least a dispersion medium and silver halide grains, wherein 60% or more of the total projected area of the silver halide grains is occupied by tabular grains having an epitaxial junction, which grains each have a {100} face as a main plane and an aspect ratio (diameter/thickness ratio) of from 2.0 to 100; and wherein a right-angled parallelogram enclosed with {100} side faces at the main plane edges on the portion of the tabular grains, which portion does not have the epitaxial junction, or if the tabular grains have at least one corner broken off, a right-angled parallelogram formed by extending the {100} side faces at the main plane edges, has a slenderness side ratio (a ratio of the length of the long side to that of the short side) of 1 to 6; and wherein the tabular grains have the epitaxial junction with a silver halide protrusion that has a higher solubility than the portion of the tabular grains, which portion does not have the epitaxial junction. There is also disclosed a silver halide emulsion the same to the above, except that (A) the tabular grains have no epitaxy but crystal defects for anisotropic growth and an aspect ratio of 2.0 or more, and (B) a six-coordinate dopant capable of forming a shallow electron trap is present in a crystal lattice. The silver halide emulsions are high in sensitivity and image quality, and they are excellent in suppression of dependency on a processing solution pH and in preservability of latent image, and they can be utilized in silver halide color photographic light-sensitive materials.
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Ikeda Hideo
Saitou Mitsuo
Fuji Photo Film Co.
Huff Mark F.
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