Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Two or more radiation-sensitive layers containing other than...
Patent
1985-08-05
1987-03-24
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Two or more radiation-sensitive layers containing other than...
430504, 430506, 430544, G03C 146, G03C 108, G03C 726, G03C 732
Patent
active
046525157
ABSTRACT:
A silver halide color photographic material which comprises a support having thereon at least two silver halide light-sensitive layers having essentially the same color sensitivity but different speeds and a light-insensitive layer positioned adjacent to the highest-speed layer of said light-sensitive layers and containing a compound which reacts with the oxidation products of a color developing agent to form a diffusible development restraining compound or a precursor thereof. The photographic material provides a color image having excellent graininess and color reproduction and has excellent characteristics of development processing.
REFERENCES:
patent: 3892572 (1975-07-01), Shiba et al.
patent: 4141730 (1979-02-01), Minagawa et al.
patent: 4145219 (1979-03-01), Kato et al.
patent: 4173479 (1979-11-01), Ranz et al.
patent: 4348474 (1982-09-01), Scheerer et al.
patent: 4500634 (1985-02-01), Sakanoue et al.
patent: 4539289 (1985-09-01), Saito et al.
patent: 4543323 (1985-09-01), Iijima et al.
Arakawa Jun
Nagaoka Satoshi
Ogawa Tadashi
Ohashi Yuichi
Tamoto Koji
Fuji Photo Film Co. , Ltd.
Kittle John E.
Shah Mukund J.
LandOfFree
Silver halide color photographic materials having improved devel does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silver halide color photographic materials having improved devel, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide color photographic materials having improved devel will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1353783