Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly alloy coating
Reexamination Certificate
2000-05-02
2009-12-08
Tran, Thao T. (Department: 1794)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly alloy coating
C205S238000, C205S263000, C106S001230
Reexamination Certificate
active
07628903
ABSTRACT:
A silver and silver alloy plating bath, includes (A) a soluble salt, having a silver salt or a mixture of a silver salt and a salt of a metal such as tin, bismuth, indium, lead, and the like; and (B) a particular aliphatic sulfide compound, such as thiobis(diethyleneglycol), dithiobis(triglycerol), 3,3′-thiodipropanol, thiodiglycerin, 3,6-dithiooctane-1,8-diol, and the like, which contain at least one or more of an ether oxygen atom, a 1-hydroxypropyl group, a hydroxypropylene group, or two or more of a sulfide bond in the molecule, and not containing a basic nitrogen atom. Compared to baths containing aliphatic monosulfide compounds, such as thiodiglycol or beta-thiodiglycol, which do not contain an ether oxygen atom, 1-hydroxypropyl group, a hydroxypropylene group, or two or more of a sulfide bond in the molecule, by having these particular compounds, the plating bath of the present invention has excellent stability over extended time, excellent co-deposition of silver and various metals, and excellent appearance of the electrodeposition coating.
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Patent Abstracts of Japan for JP09-143786 published on Jun. 3, 1997.
Nawafune Hidemi
Nishikawa Tetsuji
Obata Keigo
Takeuchi Takao
Tsuji Kiyotaka
Daiwa Fine Chemicals Co., Ltd.
Global IP Counselors, LLP
Ishihara Chemical Co., Ltd.
Tran Thao T.
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