Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1991-07-25
1993-04-06
McCamish, Marion E.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522 99, 522100, 522172, 525479, 528 26, 528 30, C08G 7704, C08G 7722, C08F29300, C08F 248
Patent
active
052004368
ABSTRACT:
The present invention provides novel siloxane iniferter compounds, block copolymers made therewith, and a method of making the block copolymers. The siloxane iniferter compounds can be represented by the formula ##STR1## wherein T and X are organic groups selected so that the T-X bond is capable of dissociating upon being subjected to an appropriate energy source to form a terminator free radical of the formula T.multidot. and an initiator free radical;
REFERENCES:
patent: 2938046 (1960-05-01), Morehouse
patent: 3445496 (1969-05-01), Ryan
patent: 3906018 (1975-09-01), Ostrozynski
patent: 4046795 (1977-09-01), Martin
patent: 4269963 (1981-05-01), Homan et al.
patent: 4584356 (1986-04-01), Crivello
patent: 4659777 (1987-04-01), Riffle et al.
patent: 4677169 (1987-06-01), Crivello
patent: 4689289 (1987-08-01), Crivello
patent: 4728571 (1988-03-01), Clemens et al.
patent: 4822850 (1989-04-01), Yashuda et al.
patent: 4851492 (1989-07-01), Panster et al.
patent: 4968750 (1990-11-01), Eichenauer et al.
patent: 5032460 (1991-07-01), Kantner et al.
patent: 5071936 (1991-12-01), Himori
Inoue, H; Udea A.; Nagai, S.; "Block Copolymers Derived from Azobiscyanopentanoic Acid, XI. Properties of Silicone-PMMA Block Copolymers Prepared via Polysiloxane(azobiscyanopentanamide)s", Journal of Applied Polymer Science, vol. 35, 2039-2051 (1988).
World Patents Index Latest, Week 8550, Derwent Publications Ltd., London, GB; AN 85-314533 and JP-A-60 220 341 (Nippon Teleg & Teleph), Nov. 5, 1985.
Journal of Applied Polymer Science, vol. 29, No. 3, Mar. 1984, New York, USA, pp. 877-889; H. Inquie et al., Surface Photografting of Hydrophilic Vinyl Monomers Onto Diethyldithiocarbamated Polydimethylsiloxane, (pp. 877, 878 paragraph 2, 879 paragraphs 2 and 3.
Chemical Abstracts, vol. 105, No. 20, Nov. 17, 1986, Columbus, Ohio, US; Abstract No. 173534S, H. Inquie et al., Photografting of Vinyl Monomers Into Diethyldithiocarbamated Polydimethylsiloxane, p. 34.
Inoue et al., Journal of Polymer Science Part A, 26, 1077-1092 (1988).
Otsu et al., "Living Mono- and Biradical Polymerization in Homogeneous System Synthesis of AB and ABA Type Block Copolymers", Polymer Bulletin, 11, 135-142 (1984).
Otsu et al., "Living Radical Polymerization in Homogeneous Solution by Using Organic Sulfides as Photoiniferters", Polymer Bulletin, 7, 45-50 (1982).
Experimental Methods in Polymer Chemistry, Wiley and Sons, (1981), Chapter 3, entitled "Molecular Weight Averages", pp. 57-61.
Practice of Gel Permeation Chromatography, Wiley and Sons, (1979), "Modern Size Exclusion Liquid Chromatography".
"Polymer Separation and Characterization by Thin-Layer Chromatography", by Hiroshi Inagaki, Kyoto University Kyoto, published in "Advances in Polymer Science", vol. 24, Springer-Verlage Berlin Heidelberg, (1977).
Noshay and McGrath, "Block Copolymers", Academic Press, New York, (1977) pp. 156-162, 278, 410.
Saam, Ward, and Fearon, "Polystyrene-polydimethylsiloxane Multiblock Copolymers", Advanc. Chem. Ser. No. 129, 239-47 (1973).
G. G. Hawley, Condensed Chemical Dictionary, p. 902.
Abstract, 114:7427a, Dithiocarbamate group-containing polysiloxanes as photoinitiators, EP 386,615.
Shabael's, B. M.; Rudkovskaya, G. D.; Vlasov, G. P.; (Inst. Vysokomol. Soedin., (USSR), Vysokomol. Soedin., Ser. B, 1988, 30(4), 278-81 (Russ) discusses p-bis(glycidylamino)diphenyl disulfide as iniferters and carbo chain macroinitiators based thereupon. Abstract Only.
Vanderbilt Rubber Handbook, edited by G. G. Winspear, NY, 1958.
Chemical Abstract No. 105:173534s, 60(3), 81-93, 1986, Inoue et al.
Inoue et al. article Photografting of Vinyl Monomers onto Diethyldithiocarbamated Polydimethylsiloxanes 60(3), 81-93, 1986.
Chemical Abstract 108:6649p, DE 3,606,984, Sep. 10, 1987, Eichenauer.
Chemical Abstract 108: 6650g, DE 3,606,983, Sep. 10, 1987, Eichenauer.
Chemical Abstract 109:38429d, JP 63 57 642.
Chemical Abstract 109:38622m, J. Appl. Polym. Sci., 1988, 35(8), 2039-51.
Chemical Abstract 109:55479n, JP 63 57 644.
Article, J. Poly. Sci. Poly. Chem. 24, 1197-1215 (1986), Polydimethylsiloxane-Vinyl Block Polymers.
Chemical Abstract 112:141458y, JP 01 245 007, Sep. 29, 1989.
Japan Kokai Tokkyo KO 1-245007, Tarumori; Chemical Abstract No. 11, Sep. 29, 1989.
Japan Kokai Tokkyo Koho 64-29410, Himori, Jan. 31, 1989.
Andrus, Jr. Milton H.
Kumar Ramesh C.
Mazurek Miecyzslaw H.
Berman Susan
Dowdall Janice L.
Griswold Gary L.
Kirn Walter N.
McCamish Marion E.
LandOfFree
Siloxane iniferter compounds, block copolymers made therewith an does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Siloxane iniferter compounds, block copolymers made therewith an, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Siloxane iniferter compounds, block copolymers made therewith an will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-537116