Stock material or miscellaneous articles – Composite – Of silicon containing
Reexamination Certificate
2006-03-21
2006-03-21
Zimmer, Marc S (Department: 1712)
Stock material or miscellaneous articles
Composite
Of silicon containing
C525S477000, C528S012000, C528S021000, C528S035000, C528S037000, C427S387000
Reexamination Certificate
active
07014917
ABSTRACT:
Disclosed herein are a siloxane-based resin having novel structure and an interlayer insulating film for a semiconductor device formed using the same The siloxane-based resins have so low dielectric constant in addition to excellent mechanical properties, heat-stability and crack-resistance that they are useful materials for an insulating film between interconnect layers of a semiconductor device.
REFERENCES:
patent: 3615272 (1971-10-01), Collins et al.
patent: 4399266 (1983-08-01), Matsumura et al.
patent: 4756977 (1988-07-01), Haluska et al.
patent: 4999397 (1991-03-01), Weiss et al.
patent: 5010159 (1991-04-01), Bank et al.
patent: 5468829 (1995-11-01), Bergstrom et al.
patent: 5853808 (1998-12-01), Arkles et al.
patent: 6000339 (1999-12-01), Matsuzawa
patent: 6232424 (2001-05-01), Zhong et al.
patent: 6284834 (2001-09-01), Kirchmeyer et al.
patent: 6599635 (2003-07-01), Mechtel et al.
patent: 6623711 (2003-09-01), Lyu et al.
patent: 6660822 (2003-12-01), Lyu et al.
patent: 2005/0003681 (2005-01-01), Lyu et al.
patent: 0 997 497 (2000-03-01), None
Lyu Yi Yeol
Ryu Joon Sung
Song Ki Yong
Yim Jin Heong
Harness Dickey & Pierce PLC
Zimmer Marc S
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